The super precise dimension measurement device for photomasks used for MEMS and light/power semiconductors holds much promise. It can handle photomasks of up to 9 inches and includes a work transportation function.
SAM-300
Comes with a double-pass method He-Ne laser interferometer length measuring system made by our company equipped on a surface type XYZ stage set upon a stone plate furnished with an active vibration isolation stage. Laser wavelengths are corrected through optics tracking and stage positioning is restrained to a resolution of 0.3nm through use of a plane mirror. There is also a full complement of software correction functions such as curvature correction and grid/line width correction.
Model | Measurement Range (X,Y) |
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SAM-300 | 260×260mm |
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- Photomasks used for MEMS/semiconductors